1、Chromaticity Performance: high transmittance, high saturation and high contrast.

2、Process Feature: high coating uniformity, high photosensitivity and good process margin.

3、Reliability: high heat resistance, high UV resistance, high chemical resistance and high storage stability.

Develop customized product according to client spec.

The product has high photosensitivity, high contrast, high resolution, and good process margin. It can be exposed with i-line, g-line and g-h-i line, and the resolution can be achieved 1.5μm.

It can be used in AMOLED, LCD and related semiconductor manufacturing processes.

Coating: spin or slit
Pre bake: 110℃, 160sec
Exposure: i-line, g-line, g-h-i line exposure
Development: TMAH 2.38%, 60s
Post bake: 130 ℃, 140sec